Photo Mask Cleaning Device | Simple Type Mask Cleaning Device TWC-302
"Scrub washing + rinse" & "Hot pure water drying" two-tank simple mask cleaning device
A simple mask cleaning device that removes particles larger than 1μm attached to masks. It is a two-tank mask cleaning device, where scrubbing cleaning with a dedicated brush and rinsing are performed in the first tank, and hot pure water drying is carried out in the second tank. In the scrubbing cleaning of the first layer, cleaning with a dedicated chemical solution is also offered as an option. Using the dedicated chemical solution makes it possible to remove resist residues.
- Company：TECHNOVISION, INC. main office
- Price：Other
